Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 1
Spin-coatable HfO[sub 2] resist for optical and electron beam lithographies
Saifullah, M. S. M., Khan, M. Z. R., Hasko, David G., Leong, Eunice S. P., Neo, Xue L., Goh, Eunice T. L., Anderson, David, Jones, Geraint A. C., Welland, Mark E.Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3273536
File:
PDF, 928 KB
english, 2010