Atomic layer deposition of hafnium oxide and hafnium...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2004 Vol. 22; Iss. 4

Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone

Senzaki, Yoshihide, Park, Seung, Chatham, Hood, Bartholomew, Lawrence, Nieveen, Wesley
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Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1761186
File:
PDF, 1.16 MB
english, 2004
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