Silicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma
Ohmi, Hiromasa, Kakiuchi, Hiroaki, Hamaoka, Yoshinori, Yasutake, KiyoshiVolume:
102
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2753675
File:
PDF, 1.05 MB
english, 2007