Reactive ion etching of silicon using bromine containing...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1990 / 5 Vol. 8; Iss. 3

Reactive ion etching of silicon using bromine containing plasmas

Bestwick, Tim D.
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Volume:
8
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.576832
Date:
May, 1990
File:
PDF, 961 KB
english, 1990
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