Hydrogenation kinetics and defect termination of post-plasma-treated chemical-vapor-deposited amorphous silicon film
Nakamura, Minoru, Ohno, Toshiyuki, Miyata, Kenji, Konishi, Nobutake, Suzuki, TakayaVolume:
65
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.342699
File:
PDF, 1.07 MB
english, 1989