Reduced Al/PtSi reaction up to 600 °C using an amorphous...

Reduced Al/PtSi reaction up to 600 °C using an amorphous carbon barrier layer

Chang, Chin-An
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Volume:
66
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.343741
File:
PDF, 541 KB
english, 1989
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