Diffusion barrier properties of TiW between Si and Cu
Wang, Shi-Qing, Suthar, Sailesh, Hoeflich, Christine, Burrow, Brad J.Volume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.353135
File:
PDF, 2.54 MB
english, 1993