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Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rate
Hirota, Kosa, Itabashi, Naoshi, Tanaka, JunichiVolume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4900967
Date:
November, 2014
File:
PDF, 1.37 MB
english, 2014