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Structural and electrical characterization of Si(100) implanted with P+ and Si+ ions along the [100] channelling direction
R.J. Schreutelkamp, R. De Reus, F.W. Saris, R.E. Kaim, J.F.M. Westendorp, K.T.F. Janssen, J.J.M. OttenheimVolume:
7
Year:
1990
Language:
english
Pages:
17
DOI:
10.1016/0921-5107(90)90019-8
File:
PDF, 1.47 MB
english, 1990