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Self-aligned, metal-masked dry etch processing of III–V electronic and photonic devices
S.J. Pearton, A. Katz, A. Feingold, F. Ren, T.R. Fullowan, J.R. Lothian, C.R. AbernathyVolume:
15
Year:
1992
Language:
english
Pages:
10
DOI:
10.1016/0921-5107(92)90036-9
File:
PDF, 1.36 MB
english, 1992