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Dislocation formation in silicon implanted at different temperatures
J.R. Liefting, J.S. Custer, R.J. Schreutelkamp, F.W. SarisVolume:
15
Year:
1992
Language:
english
Pages:
14
DOI:
10.1016/0921-5107(92)90052-b
File:
PDF, 2.83 MB
english, 1992