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The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide
van Veenendaal, E., van Suchtelen, J., van Enckevort, W. J. P., Sato, K., Nijdam, A. J., Gardeniers, J. G. E., Elwenspoek, M.Volume:
87
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.373603
File:
PDF, 820 KB
english, 2000