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Schottky device behavior of n-Si/Pd2Si/Al and n-Si/CoSi2/Al contacts with and without a Ta2N diffusion barrier
Mukta S. Farooq, Shyam P. MurarkaVolume:
19
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0921-5107(93)90197-u
File:
PDF, 496 KB
english, 1993