Macrodefect formation in semiconductors during high energy ion implantation: Monte Carlo simulation of damage depth distributions
S.A. Fedotov, V.S. Varichenko, A.M. Zaitsev, M. Ishimaru, Y. Hiroyama, T. MotookaVolume:
29
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0921-5107(94)04024-x
File:
PDF, 351 KB
english, 1995