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Chemical vapour deposition of diamond from a novel capacitively coupled r.f. plasma source
Richard B. Jackman, Judith Beckman, John S. FoordVolume:
29
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0921-5107(94)04040-b
File:
PDF, 323 KB
english, 1995