Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 1
Sub-200 nm gap electrodes by soft UV nanoimprint lithography using polydimethylsiloxane mold without external pressure
Hamouda, F., Barbillon, G., Gaucher, F., Bartenlian, B.Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3273535
File:
PDF, 535 KB
english, 2010