Sub-200 nm gap electrodes by soft UV nanoimprint...

Sub-200 nm gap electrodes by soft UV nanoimprint lithography using polydimethylsiloxane mold without external pressure

Hamouda, F., Barbillon, G., Gaucher, F., Bartenlian, B.
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3273535
File:
PDF, 535 KB
english, 2010
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