Reactive ion etching of GaInP/GaAs multilayer structures...

Materials Science and Engineering: B 1994 Vol. 28; Iss. 1-3

Reactive ion etching of GaInP/GaAs multilayer structures with SiCl4Cl2Ar plasma

B. Saint-Cricq, A. Sadeghi, A. Rudra, M. Ilegems
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Volume:
28
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0921-5107(94)90084-1
File:
PDF, 634 KB
english, 1994
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