Critical Dimension Uniformity Via Real-Time Photoresist...

IEEE Transactions on Semiconductor Manufacturing 2007 / 11 Vol. 20; Iss. 4

Critical Dimension Uniformity Via Real-Time Photoresist Thickness Control

Weng Khuen Ho,, Tay, A., Ming Chen,, Jun Fu,, Haijing Lu,, Xuechuan Shan,
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Volume:
20
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2007.907610
Date:
November, 2007
File:
PDF, 780 KB
english, 2007
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