![](/img/cover-not-exists.png)
[IEEE 2006 International Conference on Simulation of Semiconductor Processes and Devices - Monterey, CA, USA (2006.09.6-2006.09.8)] 2006 International Conference on Simulation of Semiconductor Processes and Devices - Flow Simulation: Advanced Dielectric Etch Equipment Design and Process Development
Bera, Kallol, Carducci, Jim, Hoffman, Daniel, Ma, ShawmingYear:
2006
Language:
english
DOI:
10.1109/sispad.2006.282881
File:
PDF, 3.23 MB
english, 2006