Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers
D. Gräf, U. Lambert, M. Brohl, A. Ehlert, R. Wahlich, P. WagnerVolume:
36
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/0921-5107(95)01265-6
File:
PDF, 389 KB
english, 1996