Self-diffusion of Si in thermally grown SiO[sub 2] under...

Journal of Applied Physics 2003 Vol. 93; Iss. 6

Self-diffusion of Si in thermally grown SiO[sub 2] under equilibrium conditions

Takahashi, Tomonori, Fukatsu, Shigeto, Itoh, Kohei M., Uematsu, Masashi, Fujiwara, Akira, Kageshima, Hiroyuki, Takahashi, Yasuo, Shiraishi, Kenji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
93
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1554487
File:
PDF, 282 KB
english, 2003
Conversion to is in progress
Conversion to is failed