New trends in atomic scale simulation of wet chemical...

New trends in atomic scale simulation of wet chemical etching of silicon with koh

H. Camon, Z. Moktadir, M. Djafari-Rouhani
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Volume:
37
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0921-5107(95)01473-x
File:
PDF, 384 KB
english, 1996
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