Metallic tin reactive sputtering in a mixture Ar–O[sub 2]: Comparison between an amplified and a classical magnetron discharge
Snyders, R., Gouttebaron, R., Dauchot, J. P., Hecq, M.Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1759349
File:
PDF, 386 KB
english, 2004