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Etching organic low dielectric film in ultrahigh frequency plasma using N[sub 2]/H[sub 2] and N[sub 2]/NH[sub 3] gases
Nagai, Hisao, Hiramatsu, Mineo, Hori, Masaru, Goto, ToshioVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1588351
File:
PDF, 506 KB
english, 2003