Effect of fluorine on boron diffusion in thin silicon...

Journal of Applied Physics 1995 Vol. 77; Iss. 1

Effect of fluorine on boron diffusion in thin silicon dioxides and oxynitride

Aoyama, Takayuki, Suzuki, Kunihiro, Tashiro, Hiroko, Toda, Yoko, Yamazaki, Tatsuya, Takasaki, Kanetake, Ito, Takashi
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Volume:
77
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.359343
File:
PDF, 580 KB
english, 1995
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