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Integrated feature scale modeling of plasma processing of porous and solid SiO[sub 2]. II. Residual fluorocarbon polymer stripping and barrier layer deposition
Sankaran, Arvind, Kushner, Mark J.Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1764822
File:
PDF, 1.95 MB
english, 2004