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Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of microwave plasma and hot filament chemical vapor deposition reactors
May, P. W., Harvey, J. N., Allan, N. L., Richley, J. C., Mankelevich, Yu. A.Volume:
108
Year:
2010
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3516498
File:
PDF, 1.36 MB
english, 2010