Temperature dependence on dry etching of Al[sub 2]O[sub 3]...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2009 Vol. 27; Iss. 4

Temperature dependence on dry etching of Al[sub 2]O[sub 3] thin films in BCl[sub 3]/Cl[sub 2]/Ar plasma

Yang, Xue, Kim, Dong-Pyo, Um, Doo-Seung, Kim, Gwan-Ha, Kim, Chang-Il
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Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3086642
File:
PDF, 920 KB
english, 2009
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