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Summary Abstract: Characterization of H2O plasma treated nickel oxide by angle resolved x-ray photoelectron spectroscopy
Haasch, Richard T.Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575640
Date:
May, 1988
File:
PDF, 446 KB
english, 1988