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Thermally activated mechanisms of hydrogen abstraction by growth precursors during plasma deposition of silicon thin films
Bakos, Tamas, Valipa, Mayur S., Maroudas, DimitriosVolume:
122
Year:
2005
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.1839556
File:
PDF, 797 KB
english, 2005