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Growth and nanostructure of conformal ruthenium films by liquid-source metalorganic chemical vapor deposition
Dey, S. K., Goswami, J., Das, A., Cao, W., Floyd, M., Carpenter, R.Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1576513
File:
PDF, 552 KB
english, 2003