Characterization of remote inductively coupled CH[sub...

Journal of Applied Physics 2005 Vol. 98; Iss. 4

Characterization of remote inductively coupled CH[sub 4]–N[sub 2] plasma for carbon nitride thin-film deposition

Seo, Hyungtak, Kim, Jung-Hyung, Chung, Kwang-Hwa, Kim, Ju Youn, Kim, Seok Hoon, Jeon, Hyeongtag
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Volume:
98
Year:
2005
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2032617
File:
PDF, 373 KB
english, 2005
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