Thermal dissociation process of hydrogen atoms in...

Thermal dissociation process of hydrogen atoms in plasma-enhanced chemical vapor deposited silicon nitride films

Maeda, Masahiko, Itsumi, Manabu
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Volume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.368813
File:
PDF, 302 KB
english, 1998
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