Thermal annealing effects on the structural and electrical properties of HfO[sub 2]/Al[sub 2]O[sub 3] gate dielectric stacks grown by atomic layer deposition on Si substrates
Cho, Moonju, Park, Hong Bae, Park, Jaehoo, Hwang, Cheol Seong, Lee, Jong-Cheol, Oh, Se-Jung, Jeong, Jaehack, Hyun, Kwang Soo, Kang, Hee-Sung, Kim, Young-Wuk, Lee, Jong-HoVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1590414
File:
PDF, 457 KB
english, 2003