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Oxygen adsorption and electrical behaviour of thin, very-low-pressure chemical-vapour-deposited polysilicon films
B. Fortin, D. Mostefa, F. Raoult, H. Lhermite, M. SarretVolume:
33
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/0924-4247(92)80229-v
File:
PDF, 558 KB
english, 1992