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Stress in low pressure chemical vapour deposition polycrystalline silicon thin films deposited below 0.1 Torr
A. Benitez, J. Bausells, E. Cabruja, J. Esteve, J. SamitierVolume:
37-38
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0924-4247(93)80122-w
File:
PDF, 588 KB
english, 1993