Stress in low pressure chemical vapour deposition...

Stress in low pressure chemical vapour deposition polycrystalline silicon thin films deposited below 0.1 Torr

A. Benitez, J. Bausells, E. Cabruja, J. Esteve, J. Samitier
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Volume:
37-38
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0924-4247(93)80122-w
File:
PDF, 588 KB
english, 1993
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