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Effects of r.f. power on optical and electrical properties of plasma-deposited hydrogenated amorphous silicon thin films
J.L. Andújar, J. Kasaneva, J. Serra, A. Canillas, C. Roch, J.L. Morenza, E. BertranVolume:
37-38
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0924-4247(93)80124-y
File:
PDF, 390 KB
english, 1993