Physical processes associated with the deactivation of...

Journal of Applied Physics 2002 Vol. 92; Iss. 1

Physical processes associated with the deactivation of dopants in laser annealed silicon

Takamura, Y., Griffin, P. B., Plummer, J. D.
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Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1481974
File:
PDF, 353 KB
english, 2002
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