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Dielectric properties of hydrogen-incorporated chemical vapor deposited diamond thin films
Liu, Chao, Xiao, Xingcheng, Wang, Jian, Shi, Bing, Adiga, Vivekananda P., Carpick, Robert W., Carlisle, John A., Auciello, OrlandoVolume:
102
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2785874
File:
PDF, 921 KB
english, 2007