Sidewall damage in plasma etching of Si/SiGe...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2009 Vol. 27; Iss. 4

Sidewall damage in plasma etching of Si/SiGe heterostructures

Ding, R., Klein, L. J., Friesen, Mark G., Eriksson, M. A., Wendt, A. E.
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Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3097858
File:
PDF, 697 KB
english, 2009
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