H2S response of WO3 thin-film sensors manufactured by silicon processing technology
I. Ruokamo, T. Kärkkäinen, J. Huusko, T. Ruokanen, M. Blomberg, H. Torvela, V. LanttoVolume:
19
Year:
1994
Language:
english
Pages:
3
DOI:
10.1016/0925-4005(93)01052-6
File:
PDF, 323 KB
english, 1994