Atomic radical abatement of organic impurities from...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 3

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Wnuk, Joshua D., Gorham, Justin M., Rosenberg, Samantha G., Madey, Theodore E., Hagen, Cornelis W., Fairbrother, D. Howard
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3378142
File:
PDF, 865 KB
english, 2010
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