Improvement of defocus tolerance in a half-micron optical...

Improvement of defocus tolerance in a half-micron optical lithography by the focus latitude enhancement exposure method: Simulation and experiment

Fukuda, Hiroshi
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Volume:
7
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.584623
Date:
July, 1989
File:
PDF, 1.03 MB
english, 1989
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