Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1989 / 7 Vol. 7; Iss. 4
Improvement of defocus tolerance in a half-micron optical lithography by the focus latitude enhancement exposure method: Simulation and experiment
Fukuda, HiroshiVolume:
7
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.584623
Date:
July, 1989
File:
PDF, 1.03 MB
english, 1989