Composition control of Hf[sub 1−x]Si[sub x]O[sub 2] films...

Applied Physics Letters 2002 Vol. 80; Iss. 13

Composition control of Hf[sub 1−x]Si[sub x]O[sub 2] films deposited on Si by chemical-vapor deposition using amide precursors

Hendrix, B. C., Borovik, A. S., Xu, C., Roeder, J. F., Baum, T. H., Bevan, M. J., Visokay, M. R., Chambers, J. J., Rotondaro, A. L. P., Bu, H., Colombo, L.
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Volume:
80
Year:
2002
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1465532
File:
PDF, 469 KB
english, 2002
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