Plasma etch fabrication of 60:1 aspect ratio silicon...

Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch

Mukherjee, Pran, Bruccoleri, Alexander, Heilmann, Ralf K., Schattenburg, Mark L., Kaplan, Alex F., Guo, L. Jay
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3507427
File:
PDF, 998 KB
english, 2010
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