Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 6
![](/img/cover-not-exists.png)
Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch
Mukherjee, Pran, Bruccoleri, Alexander, Heilmann, Ralf K., Schattenburg, Mark L., Kaplan, Alex F., Guo, L. JayVolume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3507427
File:
PDF, 998 KB
english, 2010