Passivation role of fluorine on the anticorrosion of AlCu films after plasma etching
Baek, Kyu-HaVolume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581171
Date:
May, 1998
File:
PDF, 536 KB
english, 1998