Temperature and concentration profiles in a low pressure...

Journal of Applied Physics 1995 Vol. 78; Iss. 2

Temperature and concentration profiles in a low pressure methane process plasma

Hädrich, S., Pfelzer, B., Doerk, T., Jauernik, P., Uhlenbusch, J.
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Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360371
File:
PDF, 972 KB
english, 1995
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