Effect of nitrogen at SiO[sub 2]/Si interface on...

Applied Physics Letters 2002 Vol. 81; Iss. 23

Effect of nitrogen at SiO[sub 2]/Si interface on reliability issues—negative-bias-temperature instability and Fowler–Nordheim-stress degradation

Kushida-Abdelghafar, Keiko, Watanabe, Kikuo, Ushio, Jiro, Murakami, Eiichi
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Volume:
81
Year:
2002
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1526158
File:
PDF, 456 KB
english, 2002
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