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Multicusp sources for ion beam projection lithography
Lee, Y., Gough, R. A., Kunkel, W. B., Leung, K. N., Vujic, J., Williams, M. D., Wutte, D., Zahir, N.Volume:
69
Year:
1998
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.1148469
File:
PDF, 825 KB
english, 1998