Multicusp sources for ion beam projection lithography

Lee, Y., Gough, R. A., Kunkel, W. B., Leung, K. N., Vujic, J., Williams, M. D., Wutte, D., Zahir, N.

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Volume:

Year:

1998

Language:

english

Journal:

Review of Scientific Instruments

DOI:

10.1063/1.1148469

File:

PDF, 825 KB

english, 1998

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