Integration of perovskite oxide dielectrics into complementary metal–oxide–semiconductor capacitor structures using amorphous TaSiN as oxygen diffusion barrier
Mešić, Biljana, Schroeder, HerbertVolume:
110
Year:
2011
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3641636
File:
PDF, 1.29 MB
english, 2011